Meyer, B.-U.Scherff, M.Hoffmann, J.Whu, L.Zhu, Y.Jooss, Ch.2010-06-212010-06-212009Remanent resistance changes at pcmo-metal interfaces: electrical induced polaron ordering / B.-U. Meyer, M. Scherff, J. Hoffmann, L. Whu, Y. Zhu, Ch. Jooss // Oxide materials for electronic engineering – fabrication, properties and application OMEE-2009 : international scientific workshop, June 22–26, 2009, Lviv, Ukraine : book of abstracts / Lviv Polytechnic National University. – Lviv, 2009. – P. 147.https://ena.lpnu.ua/handle/ntb/5557enelectric pulse induced resistance changes (EPIR)RRAM-technologiesarticle