Inelastic Defect Characteristic Internal Friction in SiO2, GeSi and Anisotropy Automated System “KERN-DP”

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Inelastic Defect Characteristic Internal Friction in SiO2, GeSi and Anisotropy Automated System “KERN-DP” / A. P. Onanko, G. T. Prodayvoda, Y. A. Onanko, A. V. Shabatura, A. N. Onischenko // Oxide Materials for Electronic Engineering – fabrication, properties and applications : book of abstracts international conference, May 29–June 2, 2017 Lviv, Ukraine. — Lviv, 2017. — P. 55. — (2 active media fundamentals: crystal structure and defects).