Іонна імплантація як технологія поверхневого оброблення матеріалів

Abstract

Приведені результати дослідження мікрогеометрії та когезії поверхонь, модифікованих методом іонної імплантації хрому, алюмінію, молібдену та азоту. Since the quality of metal items, their physical and mechanical properties are significantly affected by the technology of their manufacture and treatment, use of a broad spectrum of various coatings with tailored properties has become a cutting-edge field in metal processing, chemical technology, catalysis and mechanical engineering. Functional applications of coatings are much determined by their physical, mechanical and chemical properties, such as micro-geometry and surface cohesion energy of the item. Samples of 12Х18Н10Т steel (80 μm foil) modified with ions of nitrogen, chromium, aluminium and molybdenum by ion implantation were studied. The samples were treated in the vacuum chamber at the pressure of about 10-3 Pa ensured by the fore-vacuum system (fore-vacuum pump with a controlled electric valve) and the high-vacuum system (diffusion pump with a vacuum lock and controlled electric valve) and the temperature below 100ºС. The doping dosage of the samples under study was D ≈ 5·1017 cm-2. Ion flux is initiated in nitrogen plasma, which is why surface of a component part gets modified with ions of nitrogen and the target metal, forming also nitride compounds. Optical study of micro-geometry of the samples surface was conducted with a МИМ-7 microscope. It was shown that ion implantation of aluminium results in the smoother geometry and more uniform surface (Fig. 1, b). Chromium ion implantation also partially smoothes the surface, but the roughness of the surface is higher that that of aluminium (Fig. 1, c). Implantation of molybdenum ions causes higher roughness of the surface (Fig. 1, d). Cohesion analysis was carried out by scratching with a ПМТ-3 device. The data obtained are adduced in Table 1. The results show the implantation to drastically reduce cohesion with the samples surface regardless of the implanted ion type.