Development of PNH4+ sensitive isfet

dc.contributor.authorTemple-Boyer, P.
dc.contributor.authorHotra, Z.
dc.contributor.authorHolyaka, R.
dc.contributor.authorHumenyuk, I.
dc.date.accessioned2016-01-14T10:08:59Z
dc.date.available2016-01-14T10:08:59Z
dc.date.issued2004
dc.description.abstractFront-side connected, N-channel, normally-off, Si02/Si3N4 Ion Sensitive Field Effect Transistor (ISFET) microsensors have been fabricated and adapted to the ammonium ion detection thanks to polysiloxane ionosensitive layer. This photosensitive polymer has been deposited on dielectric gate and patterned either by dip coating, either by spin coating and photolithography techniques. The sensitivity characteristics of both structures have been studied. The sensors have been shows a good quasi-nernstian sensitivities to NH/ cation in the different solution of ammonium nitrate (NH4N03) IIO'^.IO'1] M.uk_UA
dc.identifier.citationDevelopment of PNH4+ sensitive isfet / P. Temple-Boyer, Z. Hotra, R. Holyaka, I. Humenyuk // Вісник Національного університету «Львівська політехніка». – 2004. – № 510 : Елементи теорії та прилади твердотілої електроніки. – С. 17–20. – Bibliography: 5 titles.uk_UA
dc.identifier.urihttps://ena.lpnu.ua/handle/ntb/31011
dc.language.isoenuk_UA
dc.publisherВидавництво Національного університету "Львівська політехніка"uk_UA
dc.titleDevelopment of PNH4+ sensitive isfetuk_UA
dc.typeArticleuk_UA

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