Remanent resistance changes at pcmo-metal interfaces: electrical induced polaron ordering
| dc.contributor.author | Meyer, B.-U. | |
| dc.contributor.author | Scherff, M. | |
| dc.contributor.author | Hoffmann, J. | |
| dc.contributor.author | Whu, L. | |
| dc.contributor.author | Zhu, Y. | |
| dc.contributor.author | Jooss, Ch. | |
| dc.date.accessioned | 2010-06-21T07:03:12Z | |
| dc.date.available | 2010-06-21T07:03:12Z | |
| dc.date.issued | 2009 | |
| dc.identifier.citation | Remanent resistance changes at pcmo-metal interfaces: electrical induced polaron ordering / B.-U. Meyer, M. Scherff, J. Hoffmann, L. Whu, Y. Zhu, Ch. Jooss // Oxide materials for electronic engineering – fabrication, properties and application OMEE-2009 : international scientific workshop, June 22–26, 2009, Lviv, Ukraine : book of abstracts / Lviv Polytechnic National University. – Lviv, 2009. – P. 147. | uk_UA |
| dc.identifier.uri | https://ena.lpnu.ua/handle/ntb/5557 | |
| dc.language.iso | en | uk_UA |
| dc.publisher | Видавництво національного університету „Львівська політехніка” | uk_UA |
| dc.subject | electric pulse induced resistance changes (EPIR) | uk_UA |
| dc.subject | RRAM-technologies | uk_UA |
| dc.title | Remanent resistance changes at pcmo-metal interfaces: electrical induced polaron ordering | uk_UA |
| dc.type | article | uk_UA |