Peculiarities of electrical discharge in the Penning’s cell with sectional anode

Abstract

Ion sputtering can be used for receiving of thin films of high temperature superconductors specifically on the base of YBaCuO ceramics [1]. But there is considerable influence of substrate placement relatively target erosion zone on the properties of films at usage of magnetron discharge of direct current. It can be explained by bombardment of substrate by ions, which appear at target material sputtering [2]. From the target erosion zone the ion stream on the substrate is maximum. To improve the properties of films the substrate is placed from one side of erosion zone but the stochiometric structure and uniformity of the film thickness on the substrate become worse [3]. To eliminate bombardment of substrate by ions, Penning’s discharge can be used. In this case two cathodes (targets) are parallel and ion streams from cathodes are moving towards. The substrate is outside discharge what allows to eliminate ion component of stream on the substrate [4].